Reactive sputtering of molybdenum‐oxide gradient‐index filters

Control of the Reactive Sputtering Process Using Two Reactive Gases

Reactive sputtering when two reactive gases are used presents special problems. Both reactive gases affect the plasma conditions, which means that both affect common feedback control signals such as the cathode voltage and optical emission signals. Two reactive gases require that unique signals for each reactive gas be acquired and that control of each of the reactive gases is done separately. ...

The reactive sputtering of oxides and nitrides

Abstrad: Recent developments in the techniques used to produce surface layers of oxides and nitrides by reactive sputtering are considered. These techniques have to give films which can be produced onto large-area, low-temperature substrate materials, such as glass and polymer. It is shown that this has led to the adoption of ion-assisted processes. In particular the use of plasmas leaked from ...

Reactive Sputtering of Bismuth Vanadate Photoanodes for Solar Water Splitting

Bismuth vanadate (BiVO4) has attracted increasing attention as a photoanode for photoelectrochemical (PEC) water splitting. It has a band gap in the visible light range (2.4−2.5 eV) and a valence band position suitable for driving water oxidation under illumination. While a number of methods have been used to make BiVO4 photoanodes, scalable thin film deposition has remained relatively underexp...

X-Ray Analysis on Ceramic Materials Deposited by Sputtering and Reactive Sputtering for Sensing Applications

Structure and mechanical properties of reactive sputtering CrSiN films

CrSiN films with various Si contents were deposited by reactive magnetron sputtering using the codeposition of Cr and Si targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and CrSiN films with various Si contents were carried out. The structure of the CrSiN filmswas found to change from crystalline to amorphous struct...